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        Ultra High Purity ReagentsUltra-clean and High-purity Reagents: As one of the main enterprises of ultra-clean and high-purity reagents in China, the company engaged in the research, development, production, and sales of ultra-clean and high-purity reagents for nearly 20 years. The company has developed and incorporated advanced technology in ultra-clean and high-purity reagents. Many products have reached the G4 level, among which are the ultra-clean and high-purity hydrogen peroxide, the ultra-clean and high-purity sulfuric acid. Meanwhile, the ultra-clean and high-purity ammonium hydroxide have achieved an overall technical breakthrough, reaching the G5 level.

        - Ultra High Purity Reagents

        Semiconductor manufacturing process
        H2O2H2SO4NH4OH

        Compliance: SEMI Grade5 standard

        SEMI Grade5 For 14nm and further technology node

        Product Information Details

        NAMEAPPLICATION
        H2O2Widely used in the semiconductor front wet cleaning process, including the cleaning of particles, metal impurities and organic residues
        H2SO4Removing photoresist and other organic residues
        NH4OHRemoving water particle and cleaning polymer
        NH4F·HFEtchant of silicon oxide used in wet etching process
        HNO3Applied in water recycling and cleaning process
        HCIApplied in metal ion impurity removing process
        C4H13NOApplied in water thinning process and also universal developer of photoresist
        • Hotline:4000-300655
        • Email:sales@jingrui-chem.com.cn
        • Address:168 Shanfeng Road, Wuzhong District, Suzhou

        All rights: Crystal Clear Electronic Material Co.,Ltd.

        Technical:EEEKEJI

        Hotline:4000-300655

        Address:168 Shanfeng Road, Wuzhong District, Suzhou

        All rights:Crystal Clear Electronic Material Co.,Ltd.

        蘇ICP備05007813號-1

        Technical:EEEKEJI

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